Toluene diisocyanate manufacturer News The market demand for photoresist adhesion promoters is vast and the number of manufacturing companies in my country is small.

The market demand for photoresist adhesion promoters is vast and the number of manufacturing companies in my country is small.


Photoresist adhesion promoter refers to a compound that increases the adhesion ability of the photoresist surface and improves the hydrophobic properties of the silicon wafer substrate surface. Photoresist is the carrier medium for photolithography imaging, which evenly covers the surface of the silicon wafer in the form of a thin film. For quartz, glass or silicon wafers with natural oxide layers, the silicon dioxide (SiO2) on the surface layer will become hydrophilic due to being exposed to atmospheric humidity for a long time, causing the photoresist to show extremely poor performance. Affinity, leading to shedding. Based on this, photoresist adhesion promoters emerged as the times require and became a key additive to improve the hydrophobic properties of the silicon wafer substrate surface.
According to the “2023-2028 Photoresist Tackifier Industry Market In-depth Research and Investment Prospect Forecast Analysis Report” released by the Industrial Research Center Show that photoresist tackifier is one of the important components of photoresist. Currently, against the background of the rapid development of domestic semiconductor, PCB, LED panel and other industries, the scale of the photoresist market continues to expand, which in turn drives the continued growth of the market demand for photoresist tackifiers. my country’s photoresist market size will be approximately 10.35 billion yuan in 2022, a year-on-year increase of 34.7%. Against this background, the domestic photoresist tackifier market demand will exceed 3,000 tons in 2022.
High-purity silazane and siloxane are common photoresist tackifiers on the market, mainly including hexamethyldisilazane (HMDS), hexamethyldisiloxane (HMDSO), and tetramethyldiethylene Disilazane (DVTMDZ), etc. Among them, hexamethyldisiloxane is the most commonly used photoresist tackifier on the market. Its principle of action is to combine one end of Si with the substrate, turning the hydrophilic -OH bond into a Si-O bond. Thus, the purpose of effectively improving the hydrophobic properties of the silicon wafer substrate surface is achieved.
In 2022, domestic hexamethyldisilazane (HMDS) production capacity will be approximately 280 million tons. However, domestic hexamethyldisilazane products are mainly industrial-grade HMDS. Hexamethyldisilazane products used as photoresist tackifiers are mainly high-purity HMDS, which have requirements for purity, performance, quality, etc. higher. Due to technical limitations, my country’s current high-purity HMDS production capacity is still relatively low. In the future, local companies will need to continue to improve their technical levels, and there is huge room for industry growth. The domestic companies that are developing photoresist adhesion promoter market mainly include Xinyaqiang Silicon Chemical Co., Ltd., Zhejiang Shuoerbo Chemical Co., Ltd., China Bluestar Group Co., Ltd., etc., and the number of companies is still relatively small.
Industrial analysis personnel said that photoresist tackifier is one of the important components of photoresist. , which mainly plays the role of improving the adhesion ability of the photoresist surface and improving the hydrophobic properties of the silicon wafer substrate surface. Under the current background of rapid development of the downstream photoresist market, the market demand for photoresist tackifiers is continuing to increase. Currently, the common photoresist tackifiers on the market are high-purity silazane and siloxane. These products have high production process requirements. Only a few domestic companies have production capabilities, and there is still huge room for growth in the industry in the future.
This article is from the Internet, does not represent the position of Toluene diisocyanate reproduced please specify the source.https://www.allhdi.com/archives/26607

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