The market demand for high barrier films for quantum dot films is high, and domestic companies have not yet achieved mass production.

High-barrier film products for quantum dot films are key products for quantum display packaging technology. The preparation technology of high-barrier films determines the performance characteristics of barrier film products. By analyzing the performance indicators of high-barrier film products for quantum dot films, we summarize the methods, principles, characteristics and applications of thermal evaporation, chemical vapor deposition, atomic layer deposition, etc. to prepare flexible high-barrier films, and look forward to the development prospects of barrier film products for quantum dot films. .

At present, based on the characteristics of organic/inorganic multi-layer film formation, it can be concluded that the barrier performance improvement of high barrier films is mainly achieved through vacuum coating technology. Electron beam evaporation technology has the fastest production rate, poor barrier performance, and the lowest manufacturing cost. It is suitable for evaporation coating of metals such as aluminum. Magnetron sputtering technology can greatly improve the barrier performance, but the manufacturing cost is high, but it is not suitable for industrial promotion. The winding PECVD has higher cost, faster production rate, and excellent barrier performance, so it is very suitable for industrial applications. Atomic layer deposition technology can use several layers of atomic-level films to achieve excellent barrier properties, but the deposition rate is slow, and roll-to-roll atomic layer deposition equipment is still in the research and development stage.

According to the released “2022-2027 High Barrier Film Industry Market In-depth Research and Investment Prospects Forecast Analysis Report” , Quantum dot film can be used in televisions, computer monitors, electronic blackboards, PADs, vehicle displays, mobile phone displays and other fields. High barrier film products are a key component of quantum dot films. With the market promotion and high-end display applications of quantum dot films, the demand for high barrier film products has shown a rapid growth trend. By 2025, the market capacity is expected to reach more than 100 million square meters. The market size About 4.2 billion yuan.

At present, domestic high-barrier film products for quantum dot films mainly rely on imports and do not have batch production equipment. University research institutes have accumulated rich experience in barrier film preparation processes and small-scale production, but they are not familiar with multi-layer structures. There are few reports on the mass production of ultra-high barrier films.

At present, the barrier film products for quantum dot films are mainly transparent silicon oxide films. Transparent silicon oxide films have excellent optical properties and good barrier properties, and are widely used in quantum dot film products. Currently, there is no large-scale production of silicon oxide films for quantum dot films in China. They are mainly supplied in small quantities by 3M from the United States and Japan’s Taichi, which are expensive. Since 2016, domestic Wanshun, Kangdexin, Ji Zhi Technology, etc. With the introduction of foreign production equipment and technology, the development and production capacity of transparent oxide films has been greatly improved, and small batch applications have been achieved in some quantum dot film products.

Industry analysts said that with the continuous development of the flexible electronic product market represented by quantum dot film and OLED, ultra-high barrier The market demand for membranes will inevitably expand further. Today, many companies and research institutions are continuously developing barrier films with higher barrier properties in order to meet the growing needs of the market. Moreover, 3M, GE and other companies have launched commercial production of ultra-high barrier films, but only for some small-scale applications.