BASF HB 175 MP/X biuret curing agent; Basonat HB 100 solvent-free curing agent
Chemical Structure Polyisocyanate obtained by polymerizing hexamethylene diisocyanate series Basonat® HB 100 None Solvent-based Basonat® HB 175 MP/X Use 1: 1 Butyl acetate withSolvesso® 100 Mixed so…